Advantages of directed self assembly resolution of 20nm and possibly lower can be integrated with current patterning techniques inexpensive. Electronbeam lithography was performed using a hydrogen silsesquioxane hsq resist on silicon substrates to fabricate topographic features of. Lithographically directed selfassembly of nanostructures. Fabrication of nonperiodic metasurfaces by microlens. Directed self assembly dsa of block copolymers bcp is envisaged as an alternative complementary technique that can reduce critical dimension and pitch with high throughput and limited cost 1. An alternative technology is directed selfassembly dsa of block copolymer bcp, which has a great potential for coste. Nanospheres lithography nsl is a manufacturing technique based on the selfassembly sa process of colloidal spheres 1. Directed self assembly materials for semiconductor lithography.
As chipmakers contemplate patterning at the 5 nm node and beyond, finding cost effective lithography solutions for highresolution patterning is increasingly challenging. Physical design and mask synthesis for directed selfassembly. Basics of block copolymer directed self assembly block copolymer directed self assembly dsa is a technique used to create high resolution structures without advanced lithography techniques. In conclusion, advances in fluidics, integrating materials like quantum dots and solvent resistant elastomers along with 3d fabrication and methods of self assembly, provide a new set of tools. Directed self assembly of block copolymers can generate complex and wellordered nanoscale patterns for lithography. This intro to dsa is geared towards those with little to no background and are interested in learning more. Dsa technologies hold the promise to substantially improve the resolution of existing lithographic processes such as selfaligned. Directed self assembly of a highchi block copolymer for the fabrication of optical nanoresonators s.
Directed selfassembly dsa is currently being explored as a new method for substituting resist in sub14 nm technologies. Request pdf application of directed selfassembly lithography to semiconductor device manufacturing process directed selfassembly dsa lithography has recently entered the spotlight as one. Directed self assembly of block copolymers on chemical patterns. Integration of the directed selfassembly with nanoimprint lithography provides a wellaligned array of nanofins with a depth of. Key parameters of interest are guide cd, polymer cd, and residual polymer thickness at the bottom of the guide cavity. Various advanced directed selfassembly approaches are examined, in which block copolymer selfassembly is synergistically integrated with conventional photolithography, such as arf lithography or iline lithography, via either epitaxial selfassembly or the graphoepitaxy principle.
Directed selfassembly of oligodimethylsiloxane liquid. Directed selfassembly of diblock copolymers in multivia configurations. Directed self assembly of nanospheres for nanolithography and. Directed selfassembly of block copolymers for next generation nanolithography. Raghunath murali, microelectronics research center, georgia institute of technology nnin reu mentor. Directed selfassembly of a twostate block copolymer system nano. Directed assembly or more specifically directed self assembly, can produce a high pattern resolution 10 nm with high efficiency and compatibility. Selective directed self assembly of coexisting morphologies using block copolymer blends a.
Patterning of sub10nm ge islands on si100 by directed. Nanopatterning of graphene guided by block copolymer self. This project explores the possibility of using directed self assembly to attain longrange ordering of c96 fibers for use in post32 nm lithography. Black1 directed self assembly dsa of block copolymers is an emergent technique for nano lithography, but is limited in the range of structures possible in a single fabrication step. In this work, we map block copolymer self assembly. They have applications in electronics,7 magnetics,8 and photonics.
Polystyrene nanospheres with 500 nm diameter are then assembled on the resist template using convective assembly, resulting in template directed assembly. Directed assembly of micro and nanostructures wikipedia. A simulation analysis on defect annihilation in directed self assembly lithography katsuyoshi kodera, hideki kanai, yuriko seino, hironobu sato, yusuke kasahara, katsutoshi kobayashi, hiroshi kubota, naoko kihara, yoshiaki kawamonzen, shinya minegishi, ken miyagi, toshikatsu tobana, masayuki shiraishi, satoshi nomura and tsukasa azuma. Previously, self consistent field theory has been commonly used to model and predict the block co polymer morphology resulting from a given template. Even so, the high costs of these technologies have left room in the lithography ecosystem for lowcost alternatives, such as block copolymer directed self assembly dsa. Not all sublayouts are allowed, and the geometry of the vias within the feasible sublayouts is specific to the technology.
Directed self assembly dsa is a promising strategy for highvolume costeffective manufacturing at the nanoscale. Create longrange order in the selfassembled structures align structures to existing patterns on the substrate two approaches to dsa fieldguided selfassembly. Pattern scaling with directed self assembly through. This self assembly by capillary flows can be combined with photo lithography, and is expected to find use in future nano and microfabrication schemes. Assembly of heterobimetallic fem m pd, pt complexes for magnetic patterning. Directed self assembly of block copolymers is a scalable method to fabricate wellordered patterns over the wafer scale with feature sizes below the resolution of conventional lithography. Various advanced directed self assembly approaches are examined, in which block copolymer self assembly is synergistically integrated with conventional photolithography, such as arf lithography or iline lithography, via either epitaxial self assembly or the graphoepitaxy principle. Archana kumar, jim kruger, and michelle rincon engr 241 fall 2018 introduction. Directed selfassembly of siliconcontaining block copolymer.
Modeling directed selfassembly of block copolymers for. Selfassembling block copolymers are of interest for. Physical design and mask synthesis for directed selfassembly lithography. Directed selfassembly of a highchi block copolymer for the fabrication of optical nanoresonators sozaraj rasappa, a lars schulte,b,c sokol ndonib,c and tapio niemia in this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. Although extreme ultraviolet lithography and nanoimprint lithography have better resolution than arf immersion lithography, they are still facing many challenges with performance, throughput, and cost. In block copolymer dsa, the self assembly of a block copolymer thin film is guided using topdown processes to result in a regular and oriented nanostructure array. Directed selfassembly lithography for halfpitch sub15. Create longrange order in the self assembled structures align structures to existing patterns on the substrate two approaches to dsa fieldguided self assembly.
The combination of lithography and selfassembly provides a powerful means of organizing solutionsynthesized nanostructures for a wide variety of applications. Nanoelectronics research institute imec leuven, belgium is presenting details on improvements in directed self assembly dsa process development at this weeks spie advanced lithography conference, being held in san jose, calif. Multiple lithography method for directed materials assembly. Block copolymer templatedirected synthesis of wellordered. In this paper, recent progress of directed self assembly materials and supporting materials are described. Research into new patterning processes covers the use of directed self assembly of block copolymers, extreme ultra violet euv lithography, and 3x and 4x multiple patterning. Filtration on block copolymer solution used in directed self assembly lithography toru umeda, tomoyuki takakura and shuichi tsuzuki nihon pall ltd. Path to move beyond the resolution limit with directed selfassembly. Directed selfassembly dsa dsa is a bridge between topdown and bottomup patterning can leverage existing patterning methods two possible goals for dsa. Request pdf directed selfassembly for lithography applications economics dictated that semiconductor devices need to be scaled approximately to 70. Approach is possibly the only viable method to produce sub22 nm based integrated circuits without the use of directed self assembly. Multifunctional hardmask neutral layer for directed self. A block copolymer is composed of two distinct polymer blocks bonded endtoend.
In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. Directed self assembly of a highchi block copolymer for the fabrication of optical nanoresonators sozaraj rasappa, a lars schulte,b,c sokol ndonib,c and tapio niemia in this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. Directed self assembly, next generation lithography, arf extension, pattern repair 1. Etching block copolymer directed selfassembly holes maryann c. In this method, topdown lithography defines the pattern placement, and c96 self assembly defines the pattern linewidth. Contact hole shrink process using graphoepitaxial directed. Disadvantages of dsa complex patterns can be difficult or impossible to form has to be integrated into an existing lithography process pattern formation may take large amounts of time. Lithographically directed selfassembly of nanostructures j. Fabrication of threedimensional hierarchical nanostructures. Directed selfassembly dsa of block copolymers bcps has long been viewed as a powerful alternative to extend the resolution of optical lithography. However, when using dsa in high volume manufacturing, one must have a way to quantify the degree of order of linespace patterns formed by dsa in order to reduce defect. Application of directed selfassembly lithography to. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. Directed selfassembly of a highchi block copolymer for.
Directed selfassembly for post32 nm lithography brian lambson electrical engineering, columbia university nnin reu site. Pdf directed selfassembly of block copolymers for next. A simulation analysis on defect annihilation in directed self. Recently, directed self assembly lithography dsal is attracting attention as a lowcostandfinepatterningmethod. Directed selfassembly for lithography applications request pdf.
Gerald lopez, electrical engineering, georgia institute of technology. Hybrid approach to optical cd metrology of directed self. A dense array of sub10 nm nanofins is used to realize a photonic guidedmode resonance filter. Directed selfassembly of block copolymers for next. Etching block copolymer directed selfassembly holes. Basics of block copolymer directed self assembly stanford. However, when using dsa in high volume manufacturing, one must have a way to quantify the degree of order of linespace patterns formed by. Directed selfassembly of polystyrene nanospheres by. Crosssection and topview scanning electron microscope sem images of the template directed colloidal assembly are seen in fig. Selective directed selfassembly of coexisting morphologies. Filtration on block copolymer solution used in directed self.
Directed self assembly dsa for contact layers is a challenging process in need of reliable metrology for tight process control. Dsa has shown the capability for pitch reduction multiplication, hole shrinks, cd self healing as well as a pathway towards line edge roughness ler and pattern collapse improvement 14. Nanopatterning of graphene guided by block copolymer selfassembly. Materials that self assemble form nanostructures with precise, predictable and reproducible dimensions at length scales at the molecular and atomic scale. Introduction the semiconductor industry has been developing the technologies and has been extended. Directed self assembly dsa dsa is a bridge between topdown and bottomup patterning can leverage existing patterning methods two possible goals for dsa. Directed self assembly dsa of block copolymers bcp is attracting a growing amount of interest as a technique to expand traditional lithography beyond its current limits. Ozone etching, followed by annealing in ultrahigh vacuum, yields small 4nm sic nucleation sites for subsequently deposited ge.
Directed self assembly of diblock copolymers in multivia configurations. Directed self assembly dsa is a promising solution to reduce the number of patterning steps further, as it allows assigning to the same mask a sublayout that is not lithography feasible. Approach does not employ traditional resist based lithography to define the pattern, thereby reducing the processing steps and manufacturing costs. Combining lithography and directed self assembly for the.
We show that optical cd ocd provides the needed performance for dsa contact metrology. In dsa, copolymer materials self assemble to form nanoscale resolution patterns on the semiconductor substrate. We focus on the practical advantages anticipated from directed selfassembly integration, such as pattern. Directed self assembly lithography for halfpitch sub15 nm pattern fabrication process volume 1750 hironobu sato, yuriko seino, naoko kihara, yusuke kasahara, katsutoshi kobayashi, katsuyoshi kodera, hideki kanai, yoshiaki kawamonzen, shinya minegishi, ken miyagi, toshikatsu tobana, noriyuki hirayanagi, tomoharu fujiwara, tsukasa azuma, teruaki hayakawa. Directed self assembly dsa is an emerging technology that has the ability to substantially improve lithographic manufacturing of semiconductor devices. Files available from the acs website may be downloaded for personal use only. Directed selfassembly of block copolymer article thin films.
Directed assembly or more specifically directed selfassembly, can produce a high pattern resolution 10 nm with high efficiency and compatibility. This method of templateencoded microlens projection lithography templ enables rapid prototyping of planar, multiscale patterns of similarly shaped. In dsa, copolymer materials selfassemble to form nanoscale resolution patterns on the semiconductor substrate. Microelectronics research center, georgia institute of technology nnin reu principal investigator. Directed selfassembly of block copolymers for nanolithography. Directed selfassembly dsa is an emerging technology that has the ability to substantially improve lithographic manufacturing of semiconductor devices. Nanopatterning of graphene guided by block copolymer selfassembly wang, zhongli publication date. Baaijens, voor een commissie aangewezen door het college voor promoties, in het. In addition to providing resolution beyond the current optical limits, dsa has the potential to reduce or eliminate problems with pattern collapse and line edge roughness. Finally, simple manual shearing of a sample between 2 glass slides is often. Block copolymer directed selfassembly using chemoepitaxial. Imec boosts directed selfassembly lithography process. The nanostructured gratings or nanofins were fabricated.
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